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AnisE Wet Etching Module

With the advanced cell etching simulation technology based on automatic control, accurate <100> and <110> monocrystalline silicon wafers KOH and TMAH anisotropic etching simulation results can be obtained, in addition, the use for complex layout and long-time etching is available.
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AnisE — wet etch simulation

Feature highlights

• Real time etching

• 100, 110 wafers

• Multiple etch stops

• Single/double sided etch

• Built-in etch database

• Direct geom. measurement

• Process deviation studies

 

AnisE 湿法蚀刻模块

 

Real world simulation capability

 

AnisE 湿法蚀刻模块

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With the advanced cell etching simulation technology based on automatic control, accurate <100> and <110> monocrystalline silicon wafers KOH and TMAH anisotropic etching simulation results can be obtained, in addition, the use for complex layout and long-time etching is available.

One-stop MEMS

Custom development services
Micro-nano devices processing services

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Tel:025-66621998
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Fax:025-66621978
E-mail:china@intellisense.com

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